Title:
NOVEL OXIMESTER FLUORINE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2013/165207
Kind Code:
A1
Abstract:
The present invention relates to a novel oximester fluorine compound, and to a photopolymerization initiator and a photoresist composition comprising the compound.
Inventors:
SHIN SEUNG RIM (KR)
JUN KUN (KR)
SHIN JONG IL (KR)
PARK SOO YOUL (KR)
AN KYOUNG LYONG (KR)
LEE SANG OH (KR)
MOON BONG SEOK (KR)
OH CHUNRIM (KR)
CHOI ANAM (KR)
SO IN-YOUNG (KR)
JUN KUN (KR)
SHIN JONG IL (KR)
PARK SOO YOUL (KR)
AN KYOUNG LYONG (KR)
LEE SANG OH (KR)
MOON BONG SEOK (KR)
OH CHUNRIM (KR)
CHOI ANAM (KR)
SO IN-YOUNG (KR)
Application Number:
PCT/KR2013/003847
Publication Date:
November 07, 2013
Filing Date:
May 03, 2013
Export Citation:
Assignee:
KOREA RES INST CHEM TECH (KR)
SAMYANGEMS CO LTD (KR)
SAMYANGEMS CO LTD (KR)
International Classes:
C07C251/66; C07C13/567; G03F7/004
Foreign References:
| US20010012596A1 | 2001-08-09 | |||
| US8133656B2 | 2012-03-13 | |||
| EP2072500A1 | 2009-06-24 | |||
| US20090087759A1 | 2009-04-02 |
Other References:
None
See also references of EP 2845845A4
See also references of EP 2845845A4
Attorney, Agent or Firm:
KWON, Oh-Sig et al. (KR)
권오식 (KR)
권오식 (KR)
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