Title:
NOVEL POSITIVE PHOTOSENSITIVE RESIN COMPOSITIONS
Document Type and Number:
WIPO Patent Application WO2005000912
Kind Code:
A3
Abstract:
An end-capped polybenzoxazole precursor having acid labile functional groups, positive working photosensitive compositions thereof and use of the compositions for producing heat resistant relief images on substrates.
Inventors:
RUSHKIN IILYA
NAIINI AHMAD A
HOPLA RICHARD
WATERSON PAMELA J
WEBER WILLIAM D
NAIINI AHMAD A
HOPLA RICHARD
WATERSON PAMELA J
WEBER WILLIAM D
Application Number:
PCT/US2004/017536
Publication Date:
August 18, 2005
Filing Date:
June 03, 2004
Export Citation:
Assignee:
ARCH SPEC CHEM INC (US)
International Classes:
G03F7/004; G03F7/039; G03F7/075; (IPC1-7): G03C1/73
Foreign References:
| JP2003087190A | 2003-03-20 | |||
| US20030134226A1 | 2003-07-17 | |||
| US6143467A | 2000-11-07 |
Other References:
See also references of EP 1636648A4
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