NOVEL SULFONIC ACID SALT AND DERIVATIVE THEREOF, PHOTO-ACID GENERATOR, AND PROCESS FOR PRODUCTION OF SULFONIC ACID SALT

WIPO Patent Application WO/2010/007910

A1

Disclosed is a fluorinated sulfonic acid salt or a compound having a fluorinated sulfonic acid group, which has a structure represented by general formula (1).  The salt or the compound can act as a suitable photo-acid generator, and enables the formation of a resist pattern having excellent sensitivity, resolution and mask-dependence. [In general formula (1), R represents a substituted or unsubstituted linear or branched univalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted univalent hydrocarbon group which has 3 to 30 carbon atoms and is cyclic or has a cyclic partial structure, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted univalent heterocyclic organic group having 4 to 30 carbon atoms.]

JPH08283230	PRODUCTION OF ACYLOXYALKANESULFONATE HAVING IMPROVED CHARACTERISTIC
JP5492396	Resist composition and resist pattern forming method
WO/2010/044372	FLUORINE-CONTAINING SULFONATES HAVING POLYMERIZABLE ANIONS AND MANUFACTURING METHOD THEREFOR, FLUORINE-CONTAINING RESINS, RESIST COMPOSITIONS, AND PATTERN-FORMING METHOD USING SAME

NAGAMORI MASASHI
FUJIWARA MASAKI
MORI KAZUNORI
NARIZUKA SATORU

PCT/JP2009/062278

January 21, 2010

July 06, 2009

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CENTRAL GLASS CO LTD (JP)
NAGAMORI MASASHI
FUJIWARA MASAKI
MORI KAZUNORI
NARIZUKA SATORU

C07C309/12; C07C303/22; C07C309/82; C07C381/12; C07D209/76; C09K3/00; G03F7/004

WO2008056795A1	2008-05-15
WO2008056796A1	2008-05-15

JP2008007410A	2008-01-17
JP2008007409A	2008-01-17

HASHIMOTO, Takeshi et al. (JP)
Hashimoto 剛 (JP)

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