Title:
NOVOLAC RESIN AND RESIST FILM
Document Type and Number:
WIPO Patent Application WO/2017/098880
Kind Code:
A1
Abstract:
Provided are a novolac resin having excellent development properties, heat resistance and dry-etching resistance, a light-sensitive composition containing same, a curable composition, and a resist film. The novolac resin is characterized by: having, as a repeating unit, a structural moiety indicated by structural formula (1) or (2) (in the formula, Ar indicates an arylene group. R1 each independently indicate a hydrogen atom, an alkyl group, an alkoxy group, or a halogen atom. m each independently indicate an integer of 1-3. X indicates a hydrogen atom, a tertiary alkyl group, an alkoxy alkyl group, an acyl group, an alkoxy carbonyl group, a heteroatom-containing cyclic hydrocarbon group, or a trialkyl silyl group); and at least one X present in the resin being a tertiary alkyl group, an alkoxy alkyl group, an acyl group, an alkoxy carbonyl group, a heteroatom-containing cyclic hydrocarbon group, or a trialkyl silyl group.
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Inventors:
IMADA TOMOYUKI (JP)
Application Number:
PCT/JP2016/084055
Publication Date:
June 15, 2017
Filing Date:
November 17, 2016
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
International Classes:
C08G8/28; C08L61/12; G03F7/039
Foreign References:
| JP2013189531A | 2013-09-26 | |||
| JPH03152544A | 1991-06-28 | |||
| JP2001220420A | 2001-08-14 | |||
| JPS60159847A | 1985-08-21 | |||
| JPH11149161A | 1999-06-02 |
Attorney, Agent or Firm:
KONO Michihiro (JP)
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