Title:
NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING FILM
Document Type and Number:
WIPO Patent Application WO/2016/084495
Kind Code:
A1
Abstract:
Provided are: a photosensitive composition that has excellent heat resistance, a low absorbance for g-ray, h-ray and i-ray exposure wavelengths, and high sensitivity; a resist material; a coating film thereof; and a novolac type phenol resin suitable for such applications; and manufacturing methods therefor. Specifically, provided is a novolac type phenol resin characterized in that the novolac type phenol resin is obtained by reacting a phenolic trinuclear compound (A) and formaldehyde in the presence of an acid catalyst. The phenolic trinuclear compound (A) comprises: a phenolic trinuclear compound (A1) obtained by a condensation reaction of a dialkyl-substituted phenol and a hydroxyl group-containing aromatic aldehyde; and a phenolic trinuclear compound (A2) obtained by a condensation reaction of a dialkyl-substituted phenol that has alkyl groups at positions 2 and 3, 2 and 5, 3 and 4, or 3 and 5, and an aromatic aldehyde that does not have a hydroxyl group. The molar ratio of the phenolic trinuclear compound (A1) and the phenolic trinuclear compound (A2) is 20:80 to 90:10.
Inventors:
IMADA TOMOYUKI (JP)
SATO YUSUKE (JP)
SATO YUSUKE (JP)
Application Number:
PCT/JP2015/078595
Publication Date:
June 02, 2016
Filing Date:
October 08, 2015
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
International Classes:
C08G8/20; G03F7/023
Domestic Patent References:
| WO2012063636A1 | 2012-05-18 | |||
| WO2010050592A1 | 2010-05-06 | |||
| WO2012141165A1 | 2012-10-18 | |||
| WO2014084097A1 | 2014-06-05 | |||
| WO2014017236A1 | 2014-01-30 | |||
| WO2015141427A1 | 2015-09-24 |
Foreign References:
| JPH11223939A | 1999-08-17 | |||
| JP5152447B2 | 2013-02-27 | |||
| JP2005029504A | 2005-02-03 | |||
| JP2007031402A | 2007-02-08 | |||
| JP2013174702A | 2013-09-05 |
Attorney, Agent or Firm:
KONO MICHIHIRO (JP)
Michihiro Kono (JP)
Michihiro Kono (JP)
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