Title:
NOVOLAC-TYPE PHENOLIC-HYDROXY-GROUP-CONTAINING RESIN, AND RESIST FILM
Document Type and Number:
WIPO Patent Application WO/2016/185865
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a novolac-type phenolic-hydroxy-group-containing resin having excellent developability, heat resistance and followability to substrates; and a resist film. A novolac-type phenolic-hydroxy-group-containing resin characterized by being a polycondensation product of which the essential reaction components are a phenolic-hydroxy-group-containing compound (A) represented by structural formula (1) [wherein Ar represents a group represented by structural formula (Ar-1) or (Ar-2)], a phenolic-hydroxy-group-containing compound (B) represented by structural formula (2) [wherein R3 represents an aliphatic hydrocarbon group having 4 to 20 carbon atoms; and j represents an integer of 1 to 3] and an aldehyde compound (C).
Inventors:
IMADA TOMOYUKI (JP)
SATO YUSUKE (JP)
SATO YUSUKE (JP)
Application Number:
PCT/JP2016/062614
Publication Date:
November 24, 2016
Filing Date:
April 21, 2016
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
International Classes:
C08G8/20; C07C39/15
Domestic Patent References:
| WO2012141165A1 | 2012-10-18 | |||
| WO2016084495A1 | 2016-06-02 |
Foreign References:
| JPH09194413A | 1997-07-29 | |||
| JPH02275955A | 1990-11-09 |
Attorney, Agent or Firm:
KONO MICHIHIRO (JP)
河野 通洋 (JP)
河野 通洋 (JP)
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