Title:
NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM
Document Type and Number:
WIPO Patent Application WO/2017/029935
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a novolac-type phenolic hydroxy group-containing resin having excellent developability, heat resistance and dry etching resistance; and a resist film. A novolac-type phenolic hydroxy group-containing resin characterized by having, as a repeating unit, a structural moiety (I) represented by structural formula (1) [wherein Ar represents an arylene group; R1's independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group and a halogen atom; and m's independently represent an integer of 1 to 3] or a structural moiety (II) represented by structural formula (2) [wherein Ar represents an arylene group; R1's independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group and a halogen atom; and m's independently represent an integer of 1 to 3].
Inventors:
IMADA TOMOYUKI (JP)
SATO YUSUKE (JP)
SATO YUSUKE (JP)
Application Number:
PCT/JP2016/071381
Publication Date:
February 23, 2017
Filing Date:
July 21, 2016
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
International Classes:
C07C39/15; C07C37/20; C08G8/20; C08L61/12; G03F7/023; G03F7/11
Foreign References:
| JP2014201691A | 2014-10-27 | |||
| JPH08337547A | 1996-12-24 | |||
| US3836590A | 1974-09-17 |
Other References:
MASATO ENOKI: "Synthesis and physical properties of phenolic resin oligomers with definite molecular structure", GOSEI JUSHI KOGYO KYOKAI TORONKAI KOEN YOSHISHU, vol. 39, 1989, pages 9 - 12
Attorney, Agent or Firm:
KONO Michihiro (JP)
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