NOVOLAC TYPE PHENOLIC RESIN, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, COATING FILM, AND RESIST COATING FILM

Title:

NOVOLAC TYPE PHENOLIC RESIN, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, COATING FILM, AND RESIST COATING FILM

Document Type and Number:

WIPO Patent Application WO/2016/103850

Kind Code:

A1

Abstract:

Provided are: a novolac type phenolic resin which is suitable for the achievement of a coating film that has excellent flexibility even if formed thick, while exhibiting excellent heat resistance, alkali developability, sensitivity and resolution; and the like. The present invention specifically provides a novolac type phenolic resin which is obtained by reacting (A) one or more phenolic trinuclear compounds selected from the group consisting of compounds represented by general formula (1) and compounds represented by general formula (2), (B) a monoaldehyde and (C) a polyaldehyde in the presence of an acid catalyst. (In the formulae, each of R1, R2 and R3 independently represents an optionally substituted alkyl group having 1-8 carbon atoms; R4 represents a hydrogen atom, an optionally substituted alkyl group or an optionally substituted aryl group; each of p and q independently represents an integer of 1-4; r represents an integer of 0-4; and s represents 1 or 2. In this connection, the sum of r and s is 5 or less.)

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Inventors:

IMADA TOMOYUKI (JP)
NAGAE NORIO (JP)
SATO YUSUKE (JP)

Application Number:

PCT/JP2015/078589

Publication Date:

June 30, 2016

Filing Date:

October 08, 2015

Export Citation:

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Assignee:

DAINIPPON INK & CHEMICALS (JP)

International Classes:

C08G8/20; G03F7/023

Domestic Patent References:

WO2012063636A1	2012-05-18
WO2010050592A1	2010-05-06
WO2012141165A1	2012-10-18
WO2014084097A1	2014-06-05
WO2014017236A1	2014-01-30
WO2015141427A1	2015-09-24

Foreign References:

JPH11223939A	1999-08-17
JP5152447B2	2013-02-27
JP2005029504A	2005-02-03
JP2007031402A	2007-02-08
JP2013174702A	2013-09-05

Attorney, Agent or Firm:

KONO MICHIHIRO (JP)
Michihiro Kono (JP)

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