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Title:
NOZZLE DESIGN FOR GENERATING FLUID STREAMS USEFUL IN THE MANUFACTURE OF MICROELECTRONIC DEVICES
Document Type and Number:
WIPO Patent Application WO2002079705
Kind Code:
A3
Abstract:
Improved nozzle design (1) that discharges more powerful, more focused fluid streams (3) through a series of nozzle orifices (162) distributed along a length of the nozzle (2). The present invention may be incorporated into a wide range of microelectronic device manufacturing processes and equipment types for which an array of more forceful, more focused process streams are desired for treating microelectronic workpieces. The present invention is particularly useful to cryogenically clean microelectronic workpieces, where the improvements allow the conventionally more troublesome smaller contaminant particles to be cleaningly removed with greater particle removal efficiency.

Inventors:
KUNKEL PAM
NARAYANSWAMI NATRAJ
PATRIN JOHN C
Application Number:
PCT/US2002/008316
Publication Date:
November 28, 2002
Filing Date:
March 19, 2002
Export Citation:
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Assignee:
FSI INT INC (US)
International Classes:
B05B1/20; B08B7/00; B24C1/00; B24C5/04; H01L21/00; (IPC1-7): F25D17/02; B05B7/06; B05B15/00; B05B17/00; B05B1/26; B05C5/00; A62C31/02
Foreign References:
US5942037A1999-08-24
US4806171A1989-02-21
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