NOZZLE FOR SUBSTRATE ANALYSIS AND SUBSTRATE ANALYSIS METHOD

Title:

NOZZLE FOR SUBSTRATE ANALYSIS AND SUBSTRATE ANALYSIS METHOD

Document Type and Number:

WIPO Patent Application WO/2019/016847

Kind Code:

A1

Abstract:

The present invention provides a nozzle for substrate analysis, with which it is possible to ensure prevention of leakage (dripping) of an analysis liquid from the nozzle even when a highly hydrophilic substrate is in use and to recover, at a high recovery rate, the analysis liquid after being used for sweeping. The present invention pertains to a nozzle for substrate analysis, which discharges an analysis liquid from the leading end thereof onto a substrate, and which, after the surface of the substrate is swept with the discharged analysis liquid, suctions the analysis liquid, said nozzle for substrate analysis having: a first exhaust means that is constructed with a triple pipe formed of piping for discharging and suctioning the analysis liquid, a first outer pipe provided to the outer circumference of the piping so as to enclose the analysis liquid to be used for sweeping, and a second outer pipe provided to the outer circumference side of the first outer pipe, and that utilizes the space between the piping and the first outer pipe as an exhaust pathway; and a second exhaust means that utilizes the space between the first outer pipe and the second outer pipe as an exhaust pathway.

Inventors:

KAWABATA KATSUHIKO (JP)
LEE SUNGJAE (JP)

Application Number:

PCT/JP2017/025852

Publication Date:

January 24, 2019

Filing Date:

July 18, 2017

Export Citation:

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Assignee:

IAS INC (JP)

International Classes:

G01N1/28; G01N1/00; H01L21/66

Foreign References:

JP2011128033A	2011-06-30
JPH05256749A	1993-10-05
JP2000088717A	2000-03-31
JPH1092784A	1998-04-10
JP2011128033A	2011-06-30
JPS6156893B2	1986-12-04

Other References: