Title:
NOZZLE FOR SUBSTRATE ANALYSIS
Document Type and Number:
WIPO Patent Application WO/2017/149833
Kind Code:
A1
Abstract:
The present invention provides a nozzle for substrate analysis with which it becomes possible to conduct analysis reliably without causing leakage of analyzing liquid even if a substrate having highly hydrophilic properties is swept with the analyzing liquid. The present invention provides a nozzle for substrate analysis, the nozzle being constituted of a duplex tube consisting of a nozzle body that ejects and sucks analyzing liquid and an outer tube disposed at an outer circumference of the nozzle body so as to surround the analyzing liquid used for sweeping, and the nozzle including a discharge means in which a space between the nozzle body and the outer tube serves as a gas discharge path, the nozzle being characterized in that a gas blowing tube for blowing inert gas toward the distal end of the nozzle body in a direction substantially parallel to the substrate surface is disposed on the outer circumferential side at the distal end of the outer tube on the opposite side of the sweeping direction of the nozzle.
Inventors:
KAWABATA KATSUHIKO (JP)
LEE SUNGJAE (JP)
ICHINOSE TATSUYA (JP)
LEE SUNGJAE (JP)
ICHINOSE TATSUYA (JP)
Application Number:
PCT/JP2016/081508
Publication Date:
September 08, 2017
Filing Date:
October 25, 2016
Export Citation:
Assignee:
IAS INC (JP)
International Classes:
G01N1/28; G01N1/32
Foreign References:
| JP2011128033A | 2011-06-30 | |||
| JP2012009475A | 2012-01-12 | |||
| JPH1133506A | 1999-02-09 | |||
| JPH0845832A | 1996-02-16 | |||
| JP2015099103A | 2015-05-28 | |||
| JPH05256749A | 1993-10-05 | |||
| JPH11190730A | 1999-07-13 | |||
| JP2011232182A | 2011-11-17 | |||
| JP2011128033A | 2011-06-30 | |||
| JP2012009475A | 2012-01-12 |
Other References:
See also references of EP 3351922A4
Attorney, Agent or Firm:
TANAKA AND OKAZAKI (JP)
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