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Patent Searching and Data


Title:
OBJECTIVE LENS PROTECTION DEVICE, OBJECTIVE LENS SYSTEM AND LITHOGRAPHIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/015687
Kind Code:
A1
Abstract:
An objective lens protection device, an objective lens system and a lithographic device. The objective lens protection device comprises a main structure (10); the main structure (10) is provided with, oppositely disposed, an air supply unit (11) and an extraction unit (12); the air supply unit (11) is used to output air, and the extraction unit (12) is used to extract the air output by the air supply unit (11) so as to form at least one layer of air curtain between the air supply unit (11) and the extraction unit (12). The objective lens protection device can effectively control the flow rate of wind discharge, so that the wind is controlled in a laminar flow state and the uniform flow field of the air curtain is ensured; moreover, the objective lens protection device can effectively block organic matters volatilized from the bottom up, eliminate the opportunity for a direct contact of the organic matters with the lens, and prevent the objective lens from contamination by the volatilization of the organic matters of photoresist, thus ensuring the imaging quality of the objective lens.

Inventors:
LI XIANMING (CN)
HAO BAOTONG (CN)
Application Number:
PCT/CN2018/096594
Publication Date:
January 24, 2019
Filing Date:
July 23, 2018
Export Citation:
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Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)
International Classes:
G02B27/00; G03F7/20
Foreign References:
CN107783283A2018-03-09
CN202837812U2013-03-27
CN201236208Y2009-05-13
US20020000519A12002-01-03
CN203426605U2014-02-12
CN205967805U2017-02-22
JP2015134364A2015-07-27
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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