Title:
OBSERVATION APPARATUS WITH FOCUS POSITION CONTROL MECHANISM
Document Type and Number:
WIPO Patent Application WO/2006/038439
Kind Code:
A1
Abstract:
An AF device for a microscope has an observation optical system (6) having a CCD (imaging element)(5) for emitting, through one of interchangeable objective lenses (2), illumination light to an object (3) to be observed and observing reflection light from the object (3); a projection section (7) for emitting a laser beam (invisible light) to the object (3) through the objective lens (2) of the observation optical system (6); a focus point detection optical system (10) having a photodetector (photoelectric conversion section) (8) that is disposed on an image plane of an optical image of laser beam reflected by the object (3) and outputs a signal depending on the position, in the image plane, of the optical image and detecting a relative distance between the objective lens (2) and the object (3); an object position adjustment means (11) for adjusting a focus position of the object (3) based on the output signal from the focus detection optical system (10); and a restriction means (12) for regulating the area of projection of the laser beam into the imaging area of the CCD (5).
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Inventors:
KURATA SHUNSUKE (JP)
TSUJI HARUYUKI (JP)
TSUJI HARUYUKI (JP)
Application Number:
PCT/JP2005/016843
Publication Date:
April 13, 2006
Filing Date:
September 13, 2005
Export Citation:
Assignee:
OLYMPUS CORP (JP)
KURATA SHUNSUKE (JP)
TSUJI HARUYUKI (JP)
KURATA SHUNSUKE (JP)
TSUJI HARUYUKI (JP)
International Classes:
G02B7/28; G02B21/00
Foreign References:
JP2001296469A | 2001-10-26 | |||
JPH04213438A | 1992-08-04 | |||
JPH07134242A | 1995-05-23 | |||
JPH06214150A | 1994-08-05 |
Attorney, Agent or Firm:
Tanai, Sumio (Yaes, Chuo-ku Tokyo, JP)
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