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Patent Searching and Data


Title:
OFFSET CORRECTION METHODS AND ARRANGEMENT FOR POSITIONING AND INSPECTING SUBSTRATES
Document Type and Number:
WIPO Patent Application WO2008042581
Kind Code:
B1
Abstract:
A bevel inspection module for capturing images of a substrate is provided. The module includes a rotational motor, which is attached to a substrate chuck and is configured to rotate the substrate chuck thereby allowing the substrate to revolve. The module further includes a camera and an optic enclosure, which is attached to the camera and is configured to rotate, enabling light to be directed toward the substrate. The camera is mounted from a camera mount, which is configured to enable the camera to rotate on a 180 degree plane allowing the camera to capture images of at least one of a top view, a bottom view, and a side view of the substrate. The module yet also includes a backlight arrangement, which is configured to provide illumination to the substrate, thereby enabling the camera to capture the images, which shows contrast between the substrate and a background.

Inventors:
CHEN JACK (US)
BAILEY ANDREW D III (US)
MOORING BEN (US)
CAIN STEPHEN J (US)
Application Number:
PCT/US2007/078578
Publication Date:
December 11, 2008
Filing Date:
September 14, 2007
Export Citation:
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Assignee:
LAM RES CORP (US)
CHEN JACK (US)
BAILEY ANDREW D III (US)
MOORING BEN (US)
CAIN STEPHEN J (US)
International Classes:
G03B15/00; B08B7/00; B41B17/00; G01B11/00; G01B11/02; G01N21/00; G01R31/26; G03B15/02; G03B15/03
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