Title:
ONIUM SALTS AND THE USE THEROF AS LATENT ACIDS
Document Type and Number:
WIPO Patent Application WO2002046507
Kind Code:
A3
Abstract:
A chemically amplified photoresist composition comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) as photosensitive acid donor, at least one compound of the formula Ia, Ib, Ic, IIb or IIc wherein R1 is for example C1-C5alkyl, C3-C30cycloalkyl, C1-C5haloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, C6-C12bicycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, or is a heteroaryl radical; all of which are unsubstituted or substituted; optionally some of the substituents form 5- or 6-membered rings with further substituents on the phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl ring or with one of the carbon atoms of the phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl ring; R'1 is for example C1-C12alkylene , C3-C30cycloalkylene, phenylene, naphtylene, diphenylene, or oxydiphenylene, wherein these radicals are unsubstituted or substituted; A and B for example are a direct bond; Ar1 and Ar2 independently of each other for example are phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl, all of which are unsubstituted or are substituted; Ar3, Ar4 and Ar5 for example have one of the meanings given for Ar1 and Ar2; Y is for example C3-C3-C30cycloalkylene, phenylene, naphthylene, diphenylene, or oxydiphenylene, all of which are unsubstituted or substituted.
Inventors:
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
MATSUMOTO AKIRA (JP)
OHWA MASAKI (JP)
ASAKURA TOSHIKAGE (JP)
MATSUMOTO AKIRA (JP)
OHWA MASAKI (JP)
Application Number:
PCT/EP2001/013725
Publication Date:
September 26, 2002
Filing Date:
November 26, 2001
Export Citation:
Assignee:
CIBA SC HOLDING AG (CH)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
MATSUMOTO AKIRA (JP)
OHWA MASAKI (JP)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
MATSUMOTO AKIRA (JP)
OHWA MASAKI (JP)
International Classes:
C07C25/00; C07C25/18; C07C305/04; C07C305/06; C07C305/12; C07C305/18; C07C305/20; C07C305/22; C07C305/24; C07C381/12; C07D309/06; C07D317/54; C07D333/16; C07H9/04; C08G59/68; C08G65/10; G02B5/20; G03F7/004; H01L21/027; C07B61/00; G03F7/039; (IPC1-7): G03F7/004; C08G59/68; C08G65/10; C07C25/18; C07C305/24; C07C305/06; C07C381/12; C07D309/06; C07D317/54; C07D333/16; C07H9/04
Domestic Patent References:
| WO2001040167A1 | 2001-06-07 |
Foreign References:
| EP0945475A1 | 1999-09-29 | |||
| GB1235591A | 1971-06-16 | |||
| US5314747A | 1994-05-24 | |||
| US4965379A | 1990-10-23 | |||
| EP0331988A1 | 1989-09-13 | |||
| EP0697632A2 | 1996-02-21 |
Other References:
DATABASE WPI Section Ch Week 199433, Derwent World Patents Index; Class A89, AN 1994-269405, XP002167571
PONGRATZ E ET AL: "Ylide von Heterocyclen, VIII Reaktionen von Iodonium-Yliden mit Säuren", MONATSHEFTE FUR CHEMIE., vol. 115, no. 2, 1984, SPRINGER VERLAG. WIEN., AT, pages 231 - 242, XP002199803, ISSN: 0026-9247
BUDYLIN V A ET AL, CHEMISTRY OF HETEROCYCLIC COMPOUNDS (A TRANSLATION OF KHIMIYA GETEROTSIKLICHESKIKH SOEDINENII), vol. 17, no. 11, 1981, PLENUM PRESS CO., NEW YORK, NY., US, pages 1095 - 1097, XP008003581, ISSN: 0009-3122
PONGRATZ E ET AL: "Ylide von Heterocyclen, VIII Reaktionen von Iodonium-Yliden mit Säuren", MONATSHEFTE FUR CHEMIE., vol. 115, no. 2, 1984, SPRINGER VERLAG. WIEN., AT, pages 231 - 242, XP002199803, ISSN: 0026-9247
BUDYLIN V A ET AL, CHEMISTRY OF HETEROCYCLIC COMPOUNDS (A TRANSLATION OF KHIMIYA GETEROTSIKLICHESKIKH SOEDINENII), vol. 17, no. 11, 1981, PLENUM PRESS CO., NEW YORK, NY., US, pages 1095 - 1097, XP008003581, ISSN: 0009-3122
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