OPTICAL CHARACTERISTIC MEASURING DEVICE, OPTICAL CHARACTERISTIC MEASURING METHOD, EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

WIPO Patent Application WO/2006/016584

A1

An optical characteristic measuring device (90) includes an opening (97) for passing illumination light, a micro lens array (98) for measuring a wavefront aberration, and an optical system unit (93) for selectively arranging polarized light detection system (99) for measuring the polarization state of the illumination light, on an optical path of the illumination light. Accordingly, the optical characteristic measuring device (90) can simultaneously measure the illumination shape and size of the illumination optical system, the wavefront aberration of the projection optical system, and polarization state of the illumination light. For example, even when performing exposure by the polarized illumination which is a type of modified illumination, it is possible to realize a highly-accurate exposure by adjusting the various optical systems according to the measurement result.

JPH08262711	POSITIVE TYPE RESIST COMPOSITION
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KAISE KOJI (JP)
FUJII TORU (JP)
MIZUNO YASUSHI (JP)

PCT/JP2005/014585

February 16, 2006

August 09, 2005

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NIKON CORP (JP)
KAISE KOJI (JP)
FUJII TORU (JP)
MIZUNO YASUSHI (JP)

H01L21/027; G01M11/02; G03F7/20

JP2003133207A	2003-05-09
JP2004061515A	2004-02-26
JP2004163313A	2004-06-10
JP2004165483A	2004-06-10
JP2004205500A	2004-07-22
JPH0518856A	1993-01-26

See also references of EP 1796142A4

Tateishi, Atsuji (Karakida Center Bldg. 1-53-9, Karakid, Tama-shi Tokyo 35, JP)

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