Title:
OPTICAL DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/097772
Kind Code:
A1
Abstract:
The present invention aims to provide an optical device production method whereby a beam section can be formed with high precision. This optical device production method comprises: a first step in which a semiconductor substrate (100) is prepared that has sections corresponding to a base, a movable section, and an elastic support section; a second step in which a first resist layer (104) is formed in a region corresponding to the base, on the surface on the opposite side to an insulating layer (103) in a first semiconductor layer (101); a third step in which a recessed section (105) is formed in the first semiconductor layer, by using the first resist layer (104) as a mask and etching up to an intermediate section of the first semiconductor layer in the thickness direction; a fourth step in which a second resist layer (106) is formed on a region corresponding to the beam section on a bottom surface (105a) of the recessed section (105), on a side surface (105b) of the recessed section, and on a surface (101a) on the opposite side to the insulating layer (103) in the first semiconductor layer; and a fifth step in which beam sections (224) are formed by using the second resist layers (106) as a mask and etching the first semiconductor layer (101) as far as the insulating layer (103).
Inventors:
SUGIMOTO TATSUYA (JP)
SUZUKI TOMOFUMI (JP)
KOTANI KYOSUKE (JP)
KURAMOTO YUTAKA (JP)
SUZUKI DAIKI (JP)
SUZUKI TOMOFUMI (JP)
KOTANI KYOSUKE (JP)
KURAMOTO YUTAKA (JP)
SUZUKI DAIKI (JP)
Application Number:
PCT/JP2018/029117
Publication Date:
May 23, 2019
Filing Date:
August 02, 2018
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
G02B26/08; B81B3/00; G02B26/10
Domestic Patent References:
WO2016002453A1 | 2016-01-07 |
Foreign References:
JP2016151681A | 2016-08-22 | |||
JP2016114798A | 2016-06-23 | |||
US20140327946A1 | 2014-11-06 | |||
JP2010184334A | 2010-08-26 | |||
JP2014235260A | 2014-12-15 | |||
JP2015219516A | 2015-12-07 | |||
US20080284078A1 | 2008-11-20 |
Other References:
See also references of EP 3712673A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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