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Patent Searching and Data


Title:
OPTICAL ELEMENT, METHOD FOR FORMING PHOTO-ALIGNMENT PATTERN, AND METHOD FOR MANUFACTURING OPTICAL ELEMENT
Document Type and Number:
WIPO Patent Application WO/2020/022496
Kind Code:
A1
Abstract:
The present invention provides an optical element, a method for forming a photo-alignment pattern, and a method for manufacturing an optical element. The optical element has a first optically anisotropic layer formed from a cured layer comprising a composition containing a first liquid crystal compound; the refractive index anisotropy Δn550 of the first optically anisotropic layer is 0.24 or greater, as measured with light having a wavelength of 550 nm; the first optically anisotropic layer includes a first liquid crystal alignment pattern in which the orientation of an optic axis pertaining to the liquid crystal compound changes while rotating continuously along at least one direction within a plane and in which, given that a length Λ equivalent to 180° rotation of the orientation of the optic axis within the plane corresponds to a single cycle, the length Λ of a single cycle is 1.6 μm or less.

Inventors:
SASATA KATSUMI (JP)
GOTO RYOJI (JP)
SATO HIROSHI (JP)
SAITOH YUKITO (JP)
Application Number:
JP2019/029482
Publication Date:
January 30, 2020
Filing Date:
July 26, 2019
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/30; G02B5/18
Domestic Patent References:
WO2018034216A12018-02-22
Foreign References:
JP2017522601A2017-08-10
US20170373459A12017-12-28
JP2005015406A2005-01-20
JP2007079534A2007-03-29
JP2010525395A2010-07-22
US20110262844A12011-10-27
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (3-17, Shinjuku 4-chome Shinjuku-k, Tokyo 22, 〒1600022, JP)
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