Title:
OPTICAL ELEMENT, METHOD FOR PRODUCING OPTICAL ELEMENT, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/004879
Kind Code:
A1
Abstract:
Disclosed is an optical element to be subjected to a reflow process at high temperatures, wherein cracks or wrinkles can be prevented from occurring in an antireflection film. A method for producing the optical element, and a method for manufacturing an electronic device using the optical element are also disclosed. Specifically disclosed is a method for producing an optical element comprising a base, wherein at least one optical surface is composed of a resin material, and a coating formed on the optical surface of the base and composed of an inorganic material, the optical element being mounted on a substrate together with an electronic component by a reflow process at a temperature Ta. The method is characterized in that the coating is formed at a film-forming temperature Tb of not less than (Ta - 60˚C), and a material having no glass transition temperature or a glass transition temperature of not less than (Tb - 50˚C) is used as the resin material.
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Inventors:
HARA AKIKO (JP)
TOKUHIRO SETSUO (JP)
TOKUHIRO SETSUO (JP)
Application Number:
PCT/JP2009/061595
Publication Date:
January 14, 2010
Filing Date:
June 25, 2009
Export Citation:
Assignee:
KONICA MINOLTA OPTO INC (JP)
HARA AKIKO (JP)
TOKUHIRO SETSUO (JP)
HARA AKIKO (JP)
TOKUHIRO SETSUO (JP)
International Classes:
G02B1/04; G02B1/11; G02B1/115; G02B3/00
Foreign References:
| JP2008160348A | 2008-07-10 | |||
| JP2004271653A | 2004-09-30 | |||
| JP2001201602A | 2001-07-27 | |||
| JP2008160648A | 2008-07-10 | |||
| JP2005031304A | 2005-02-03 |
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