Title:
OPTICAL ELEMENT AND PROJECTION-TYPE IMAGE DISPLAY APPARATUS
Document Type and Number:
WIPO Patent Application WO/2019/102902
Kind Code:
A1
Abstract:
Provided are an optical element in which excellent tolerance to light having high luminance and high output can be obtained, and a projection-type image display apparatus. The optical element is provided with a substrate that is transparent to light in a working wavelength band, and a birefringent layer comprising an oblique vapor deposition film having hafnium oxide as a main component thereof. The projection-type image display apparatus is provided with a liquid crystal display device having the aforementioned optical element, a light source for emitting light, and a projection optical system for projecting modulated light, the liquid crystal display device being disposed in an optical path between the light source and the projection optical system.
Inventors:
SUGAWARA JUNICHI (JP)
KANEGA YOSHI (JP)
SUGAWARA TOSHIAKI (JP)
KANEGA YOSHI (JP)
SUGAWARA TOSHIAKI (JP)
Application Number:
PCT/JP2018/041957
Publication Date:
May 31, 2019
Filing Date:
November 13, 2018
Export Citation:
Assignee:
DEXERIALS CORP (JP)
International Classes:
G02B5/30; B32B9/00; G02B1/115; G02F1/13363; G03B21/14
Foreign References:
| JP2012242449A | 2012-12-10 | |||
| JP2015082010A | 2015-04-27 | |||
| JP2008216644A | 2008-09-18 | |||
| JP2013228574A | 2013-11-07 | |||
| JP2014122984A | 2014-07-03 | |||
| JP2008268466A | 2008-11-06 | |||
| JP2008152007A | 2008-07-03 | |||
| JP2003270636A | 2003-09-25 | |||
| JP2012256024A | 2012-12-27 |
Other References:
R. B. TOKAS ET AL.: "Spectroscopic ellipsometry investigations of optical anisotropy in obliquely deposited hafnia thin films", AIP CONFERENCE PROCEEDINGS, vol. 1731, no. 1, May 2016 (2016-05-01), pages 60007 - 1 - 60007-3, XP055617348
R.B. TOKAS ET AL.: "Effect of angle of deposition on micro-roughness parameters and optical properties of Hf02 thin films deposited by reactive electron beam evaporation", THIN SOLID FILMS, vol. 609, 27 April 2016 (2016-04-27), pages 42 - 48, XP029551152, ISSN: 0040-6090, doi:10.1016/j.tsf.2016.04.034
R.B. TOKAS ET AL.: "Effect of angle of deposition on micro-roughness parameters and optical properties of Hf02 thin films deposited by reactive electron beam evaporation", THIN SOLID FILMS, vol. 609, 27 April 2016 (2016-04-27), pages 42 - 48, XP029551152, ISSN: 0040-6090, doi:10.1016/j.tsf.2016.04.034
Attorney, Agent or Firm:
NOGUCHI, Nobuhiro (JP)
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