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Title:
OPTICAL EXPOSURE APPARATUS
Document Type and Number:
WIPO Patent Application WO/1985/001834
Kind Code:
A1
Abstract:
An optical exposure apparatus in which a predetermined pattern is projected on a workpiece through an exposure lens and an alignement mark formed on the workpiece is detected through a projecting lens. It is desirable that the detected waveform of the alignement mark should not be deformed. Deformation of the waveform is caused by the interference of alignement light; therefore, to reduce the interference, light of a first wavelength and light of a second wavelength are employed as alignement light.

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Inventors:
SUGIYAMA SHUJI (JP)
SHODA SHUJI (JP)
KUNIYOSHI SHINJI (JP)
Application Number:
PCT/JP1984/000467
Publication Date:
April 25, 1985
Filing Date:
October 03, 1984
Export Citation:
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Assignee:
HITACHI LTD (JP)
International Classes:
G03F9/00; H01L21/027; H01L21/30; (IPC1-7): H01L21/30; G03F9/00
Foreign References:
JPS57112019A1982-07-12
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