Title:
OPTICAL FILM ASSESSMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2023/176585
Kind Code:
A1
Abstract:
The present invention accurately assesses the optical axis of an optical film. An assessment method according to an embodiment of the present invention is an optical film assessment method comprising: disposing an optical film on a substrate that has a straight line portion on the outer periphery thereof; measuring the optical axis of the optical film using the straight line portion of the substrate as a reference; and correcting the measurement result on the basis of the positional relation between the substrate and the optical film.
Inventors:
NOGUCHI KOKI (JP)
TOKUOKA SAKIMI (JP)
GOTO SHUSAKU (JP)
TOKUOKA SAKIMI (JP)
GOTO SHUSAKU (JP)
Application Number:
PCT/JP2023/008533
Publication Date:
September 21, 2023
Filing Date:
March 07, 2023
Export Citation:
Assignee:
NITTO DENKO CORP (JP)
International Classes:
G01N21/21; G01M11/00; G01N21/01; G02B3/00; G02B5/00; G02B5/08; G02B5/30; G02B27/02
Foreign References:
| JPH0518858A | 1993-01-26 | |||
| JP3228809U | 2020-11-12 | |||
| JP2010139345A | 2010-06-24 | |||
| JP2006098087A | 2006-04-13 | |||
| JP2011115985A | 2011-06-16 |
Attorney, Agent or Firm:
MOMII Takafumi (JP)
Download PDF: