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Title:
OPTICAL MATERIAL, METHOD FOR MANUFACTURING OPTICAL MATERIAL, AND IMAGE DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/159042
Kind Code:
A1
Abstract:
Provided is an optical material wherein the proportion of a retro-reflective area of the optical material is large when observed with light obliquely irradiated relative to the direction of the normal of the optical material. The optical material includes a substrate and a dot formed on the surface of the substrate. The dot has wavelength selective reflectivity and a cholesteric structure that gives a stripe pattern formed by bright and dark parts in a cross-sectional view of the dot as observed with a scanning electron microscope. The profile of the dot opposite the substrate in the cross-section along the thickness direction thereof has at least one inflection point, and the angle formed between the normal to a line formed by a first dark part from the surface of the dot opposite the substrate and said surface in the cross-section along the thickness direction of the dot is within the range of 70° to 90°. Also provided are a method for manufacturing the optical material, and an image display device.

Inventors:
YAMAMOTO AKIRA (JP)
ITO YOJI (JP)
NAGAI MICHIO (JP)
KASHIWAGI DAISUKE (JP)
ICHIHARA NOBUHIKO (JP)
Application Number:
PCT/JP2016/060302
Publication Date:
October 06, 2016
Filing Date:
March 30, 2016
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/26; G06F3/042
Foreign References:
JP2008180798A2008-08-07
JP2008250541A2008-10-16
JP2010085532A2010-04-15
JP2002002103A2002-01-08
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
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