Title:
OPTICAL MULTILAYER FILM FILTER, PRODUCTION METHOD FOR OPTICAL MULTILAYER FILM FILTER, OPTICAL LOW-PASS FILTER, AND ELECTRONIC EQUIPMENT SYSTEM
Document Type and Number:
WIPO Patent Application WO/2005/010575
Kind Code:
A1
Abstract:
A dielectric multilayer film having high-refractive-index material layers and low-refractive-index material layers alternately formed is formed on one surface of a transparent substrate of an optical multilayer film filter in which dielectric thin films are laminated on the transparent substrate, a dielectric single-layer film is formed on the other surface of the transparent substrate, and the dielectric single-layer film is formed of a dielectric material being substantially the same in refractive index as the transparent substrate. This construction can further reduce a degree of warpage of a substrate due to the stress of dielectric thin films laminated on a transparent substrate, and provide an optical-warpage-prevented optical multilayer film filter and a production method for the optical multilayer film filter.
Inventors:
YANO KUNIHIKO
KAZAMA MINORU
KITAMURA KEIKO
KAZAMA MINORU
KITAMURA KEIKO
Application Number:
PCT/JP2004/010383
Publication Date:
February 03, 2005
Filing Date:
July 14, 2004
Export Citation:
Assignee:
SEIKO EPSON CORP (JP)
International Classes:
G02B5/28; G02B5/30; G03B11/00; H04N5/225; (IPC1-7): G02B5/28; H04N5/225; H01L27/14
Foreign References:
| JPH06265722A | 1994-09-22 | |||
| JP2002279685A | 2002-09-27 | |||
| JPH05127018A | 1993-05-25 | |||
| JPS6296621U | 1987-06-19 |
Attorney, Agent or Firm:
Kamiyanagi, Masataka c/o Intellectual, Property Division (SEIKO EPSON CORPORATION 3-5, Owa 3-Chom, Suwa-Shi Nagano 02, JP)
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