Title:
OPTICAL SYSTEM ALIGNING DEVICE AND OPTICAL SYSTEM ALIGNING METHOD FOR LASER PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2017/069389
Kind Code:
A1
Abstract:
Disclosed are a device and method for aligning a laser optical system constituting a laser processing apparatus. The disclosed optical system aligning device for a laser processing apparatus comprises: a laser optical system through which a laser beam passes; a Shack-Hartmann sensor for measuring a light wavefront of the laser beam emitted from the laser optical system; and a computing unit for expressing the light wavefront of the laser beam detected by the Shack-Hartmann sensor in an equation, and calculating an eccentric value for the laser optical system, which arises when the laser optical system becomes misaligned.
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Inventors:
KIM BYUNG OH (KR)
LEE DONG JUN (KR)
LEE DONG JUN (KR)
Application Number:
PCT/KR2016/009014
Publication Date:
April 27, 2017
Filing Date:
August 17, 2016
Export Citation:
Assignee:
EO TECHNICS CO LTD (KR)
International Classes:
B23K26/042; B23K26/03; B23K26/067; G01J9/00; G01J9/02
Foreign References:
| JP2015055544A | 2015-03-23 | |||
| JP2014081216A | 2014-05-08 | |||
| JPH08261842A | 1996-10-11 | |||
| KR20150080563A | 2015-07-09 | |||
| KR20120044927A | 2012-05-08 |
Attorney, Agent or Firm:
Y.P.LEE, MOCK & PARTNERS (KR)
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