Title:
OPTICAL SYSTEM, OPTICAL EQUIPMENT, AND OPTICAL SYSTEM MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/116564
Kind Code:
A1
Abstract:
An optical system (LS) includes an aperture stop (S), and a negative lens (L15) that is disposed farther on the object side than the aperture stop (S) is and satisfies the following conditional expressions: ndN1+(0.01425×νdN1) < 2.12; 18.0 <νdN1 < 35.0; and 0.702 <θgFN1+(0.00316×νdN1), where ndN1 is the refractive index of the negative lens with respect to the d-line, νdN1 is the Abbe number of the negative lens using the d-line as a reference, and θgFN1 is the partial dispersion ratio of the negative lens. θgFN1 is defined as θgFN1 = (ngN1-nFN1)/(nFN1-nCN1), assuming that the refractive index of the negative lens with respect to the g-line is ngN1, the refractive index of the negative lens with respect to the F-line is nFN1, and the refractive index of the negative lens with respect to the C-line is nCN1.
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Inventors:
YAMASHITA MASASHI (JP)
ITO TOMOKI (JP)
YABUMOTO HIROSHI (JP)
YAMAMOTO HIROSHI (JP)
MIWA SATOSHI (JP)
TSUBONOYA KEISUKE (JP)
MAKIDA AYUMU (JP)
UEHARA TAKERU (JP)
ITO TOMOKI (JP)
YABUMOTO HIROSHI (JP)
YAMAMOTO HIROSHI (JP)
MIWA SATOSHI (JP)
TSUBONOYA KEISUKE (JP)
MAKIDA AYUMU (JP)
UEHARA TAKERU (JP)
Application Number:
PCT/JP2017/045184
Publication Date:
June 20, 2019
Filing Date:
December 15, 2017
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G02B13/00; G02B13/02; G02B13/04; G02B15/20
Foreign References:
JP2010060612A | 2010-03-18 | |||
JP2010139766A | 2010-06-24 | |||
JPS60198512A | 1985-10-08 | |||
JP2009280724A | 2009-12-03 | |||
JP2017190280A | 2017-10-19 |
Attorney, Agent or Firm:
OHNISHI, Shogo et al. (JP)
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