Title:
OPTICAL SYSTEM AND EXPOSURE SYSTEM PROVIDED WITH THE OPTICAL SYSTEM
Document Type and Number:
WIPO Patent Application WO/2002/097508
Kind Code:
A1
Abstract:
An optical system having a good optical performance without being practically affected by double refraction even if an optical material having an intrinsic double refraction, such as fluorite, is used. The optical system comprises a fifth−group light transmitting member having a feature of practically transmitting light with a wavelength of up to 200 nm and being formed to have an optical axis aligned with a crystal axis [110] or a crystal axis practically optically equivalent to the crystal axis [110], and a sixth−group light transmitting member having a feature of practically transmitting light with a wavelength of up to 200 nm and being formed to have an optical axis aligned with a crystal axis [110] or a crystal axis practically optically equivalent to the crystal axis [110]. The fifth−group light transmitting member and the sixth−group light transmitting member are so related in position as to be rotated about 90° from each other around an optical axis.
Inventors:
OWA SOICHI
SHIRAISHI NAOMASA
OMURA YASUHIRO
TANAKA ISSEI
SHIRAISHI NAOMASA
OMURA YASUHIRO
TANAKA ISSEI
Application Number:
PCT/JP2002/005245
Publication Date:
December 05, 2002
Filing Date:
May 29, 2002
Export Citation:
Assignee:
NIPPON KOGAKU KK (JP)
International Classes:
G02B13/24; G02B1/02; G02B5/30; G02B13/14; G02B27/28; G03F7/20; H01L21/027; (IPC1-7): G02B13/24; H01L21/027
Foreign References:
| EP1063684A1 | 2000-12-27 | |||
| JP2000331927A | 2000-11-30 |
Attorney, Agent or Firm:
Yamaguchi, Takao (10 Kanda-tsukasacho 2-chom, Chiyoda-ku Tokyo, JP)
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