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Patent Searching and Data


Title:
OPTICAL SYSTEM AND METHOD FOR MEASURING THE INTENSITY OF EUV RADIATION IN THE OPTICAL SYSTEM
Document Type and Number:
WIPO Patent Application WO/2016/078983
Kind Code:
A3
Abstract:
The invention relates to an optical system and a method for measuring the intensity of EUV radiation (35) in the optical system, more particularly an optical system having a microlithographic projection exposure apparatus or a mask inspection apparatus. To measure the intensity, the detector material (11, 32) used is a Group III nitride, which, depending on the measuring principle, is used to produce a photoelectric current as an absorber material in a photodiode (10) or to produce secondary radiation (36) in a quantum converter (31, 32). By measuring the secondary radiation or luminescence light at different photon energy levels it is possible to monitor the ageing or degradation of the detector material (32).

Inventors:
HERMANN MARTIN (DE)
Application Number:
PCT/EP2015/076311
Publication Date:
July 07, 2016
Filing Date:
November 11, 2015
Export Citation:
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Assignee:
ZEISS CARL SMT GMBH (DE)
HERMANN MARTIN (DE)
International Classes:
H01L31/108; G01J1/58; H01L31/0224; H01L31/0232; H01L31/0304; H01L31/102
Foreign References:
US20080087914A12008-04-17
US20130292685A12013-11-07
Other References:
PAWEL MALINOWSKI ET AL: "Extreme ultraviolet imaging with hybrid AlGaN arrays", COMPOUND SEMICONDUCTOR, vol. 17, no. 1, 22 February 2011 (2011-02-22), US, pages 29 - 32, XP055255084, ISSN: 1096-598X
MALINOWSKI PAWEL ET AL: "Extreme ultraviolet detection using AlGaN-on-Si inverted Schottky photodiodes", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS, 2 HUNTINGTON QUADRANGLE, MELVILLE, NY 11747, vol. 98, no. 14, 141104, 5 April 2011 (2011-04-05), pages 1 - 3, XP012140180, ISSN: 0003-6951, DOI: 10.1063/1.3576914
Attorney, Agent or Firm:
FRANK, Hartmut (Reichspräsidentenstraße 21-25, Mülheim a.d. Ruhr, DE)
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