Title:
OPTICAL SYSTEM OF PROJECTION OBJECTIVE LENS, AND MASK ALIGNER
Document Type and Number:
WIPO Patent Application WO/2019/129051
Kind Code:
A1
Abstract:
An optical system of a projection objective lens for imaging a pattern on an object plane to an image plane, the optical system sequentially comprising, from the side of the object plane along an optical axis direction: a first lens group (G1) having a negative optical power; a second lens group (G2) having a positive optical power; a third lens group (G3) having a positive optical power; an aperture stop; a fourth lens group (G4) having a positive optical power, the fourth lens group and the third lens group being symmetrical with respect to the aperture stop; a fifth lens group (G5) having a positive optical power, the fifth lens group and the second lens group being symmetrical with respect to the aperture stop; and a sixth lens group (G6) having a negative optical power, the sixth lens group and the first lens group being symmetrical with respect to the aperture stop. The optical system of the projection objective lens has a wide field of view and is applicable to g-, h-, and i-line wavelengths, ensuring image quality while significantly improving yield of an exposure process. Also disclosed is a mask aligner.
Inventors:
HOU BAOLU (CN)
Application Number:
PCT/CN2018/123864
Publication Date:
July 04, 2019
Filing Date:
December 26, 2018
Export Citation:
Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)
International Classes:
G03F7/20; G02B13/22
Foreign References:
| CN104122669A | 2014-10-29 | |||
| CN101571622A | 2009-11-04 | |||
| CN102279457A | 2011-12-14 | |||
| CN102298196A | 2011-12-28 | |||
| US6903804B2 | 2005-06-07 |
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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