Title:
OPTIMIZATION METHOD FOR WORK SYSTEM, AND CONTROL SYSTEM
Document Type and Number:
WIPO Patent Application WO/2024/070282
Kind Code:
A1
Abstract:
According to the present invention, a management device optimizes a work system. More specifically, this management device: sets a control parameter set that is made up of one or more parameters for controlling actions of the work system (step S10); controls the actions of the work system on the basis of the control parameter set (step S12); acquires an observation value relating to the work system in relation to execution of the actions based on the control parameter set (step S14); calculates a posterior distribution of a model function in which one or more parameters are variables by using the control parameter set and the observation value (step S20); and updates an optimization function for identifying an optimal parameter set as the control parameter set, using calculation results of the posterior distribution (step S24).
Inventors:
KURATA SEIYA (JP)
Application Number:
PCT/JP2023/029396
Publication Date:
April 04, 2024
Filing Date:
August 14, 2023
Export Citation:
Assignee:
SHIMADZU CORP (JP)
International Classes:
G06N99/00
Domestic Patent References:
| WO2021049044A1 | 2021-03-18 | |||
| WO2021024396A1 | 2021-02-11 |
Foreign References:
| JP2022074880A | 2022-05-18 | |||
| JP2019152986A | 2019-09-12 |
Attorney, Agent or Firm:
FUKAMI PATENT OFFICE, P.C. (JP)
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