Title:
ORBITRON PUMP AND ELECTRON BEAM DEVICE USING ORBITRON PUMP
Document Type and Number:
WIPO Patent Application WO/2014/132758
Kind Code:
A1
Abstract:
The purpose of the present invention is to achieve extended life for an orbitron pump. An orbitron pump has an anode (1), a cathode (2), and a filament (3) for electron discharge disposed inside a pump chamber (4). The surface of the cathode (2) has a nonvolatile getter material. Thus, by increasing the volume of the cathode, extended life is achieved for the pump without causing reductions in pump performance such as reductions in exhaust rate and increases in gas release.
Inventors:
KANEDA MINORU (JP)
ITO HIROYUKI (JP)
MURAKOSHI HISAYA (JP)
ITO HIROYUKI (JP)
MURAKOSHI HISAYA (JP)
Application Number:
PCT/JP2014/052614
Publication Date:
September 04, 2014
Filing Date:
February 05, 2014
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/18; F04B37/02; H01J41/16
Foreign References:
| JPH0422144B2 | 1992-04-15 | |||
| JP2010073413A | 2010-04-02 | |||
| JPH07254388A | 1995-10-03 | |||
| JPH0765762A | 1995-03-10 |
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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