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Patent Searching and Data


Title:
ORGANIC MATTER-DEGRADING APPARATUS AND ORGANIC MATTER-DEGRADING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/217005
Kind Code:
A1
Abstract:
The present invention provides an organic matter-degrading apparatus and organic matter-degrading method capable of rapidly de-odorizing a liquid product production facility. An organic matter-degrading apparatus (1) is provided with: a supply pipe (120) supplying cleaning liquid to a facility (F) to be cleaned; a recovery pipe (110) for recovering the cleaning liquid; an ozone-processing unit (20) for causing ozone to act on the recovered cleaning liquid; a de-gassing unit (20) for de-gassing the cleaning liquid; and a heating device (80). The heating device (80) heats the cleaning liquid so that the inlet temperature at the ozone-processing unit (20) is at least 50°C and the organic matter-degrading apparatus (1) re-supplies the de-gassed cleaning liquid to the facility (F) to be cleaned. The organic matter-degrading method comprises: a step for causing ozone to act on the cleaning liquid recovered from the facility (F) to be cleaned; a step for degassing the cleaning liquid; a step for heating the cleaning liquid; and a step for re-supplying the cleaning liquid to the facility (F) to be cleaned. In the step for heating the cleaning liquid, the cleaning liquid is heated so that the temperature of the cleaning liquid when subjected to the action of the ozone is at least 50°C.

Inventors:
WADA Keishi (6-6, Marunouchi 1-chome, Chiyoda-k, Tokyo 80, 〒1008280, JP)
NOTO Kazuhiko (6-6, Marunouchi 1-chome, Chiyoda-k, Tokyo 80, 〒1008280, JP)
HIGASHI Eiji (6-6, Marunouchi 1-chome, Chiyoda-k, Tokyo 80, 〒1008280, JP)
HATA Kazuhiro (6-6, Marunouchi 1-chome, Chiyoda-k, Tokyo 80, 〒1008280, JP)
Application Number:
JP2017/004445
Publication Date:
December 21, 2017
Filing Date:
February 07, 2017
Export Citation:
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Assignee:
HITACHI, LTD. (6-6 Marunouchi 1-chome, Chiyoda-ku Tokyo, 80, 〒1008280, JP)
International Classes:
C02F1/78; B08B3/10; B08B9/032; C02F1/20
Foreign References:
JPH07956A1995-01-06
JP2007236706A2007-09-20
JPH0523683A1993-02-02
JPH10170695A1998-06-26
JP2002292378A2002-10-08
JP2009240848A2009-10-22
JP2002028668A2002-01-29
JP2012206048A2012-10-25
JP2001345304A2001-12-14
JP5936743B12016-06-22
Attorney, Agent or Firm:
ISONO INTERNATIONAL PATENT OFFICE, P.C. (Hulic Toranomon Building, 1-18 Toranomon 1-chome, Minato-k, Tokyo 01, 〒1050001, JP)
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