Title:
ORGANIC POLYMER FILM, METHOD FOR PRODUCING THE SAME AND SEMICONDUCTOR DEVICE USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2003/011951
Kind Code:
A1
Abstract:
An organic polymer film which can be produced by a method comprising sublimating a cyclophane compound containing fluorine at 30 to 70&ring C, thermally decomposing the sublimated product at 680 to 770&ring C into a para−xylylene monomer, polymerizing the para−xylylene monomer on a base plate at −40 to 20&ring C to thereby provide a fluorinated poly(para−xylylene), and then subjecting the fluorinated poly(para−xylylene) to specific gradual heating steps of programmed (temperature rising) heating and constant temperature heating&semi a method for producing the polymer film and a semiconductor device using the polymer film. The organic polymer film exhibits a low dielectric constant and also high heat resistance, and thus can be suitably applied to an insulating layer for use in a semiconductor device.
Inventors:
TAKAHASHI AKIO (JP)
SATSU YUICHI (JP)
NAKAI HARUKAZU (JP)
YEFIMOVICH KARDASH IGOR (RU)
VLADIMIROVICH PEBALK ANDREI (RU)
NICOLAEVICH CHVALUN SERGEI (RU)
ANDRANIKOVICH MAILYAN KAREN (RU)
SATSU YUICHI (JP)
NAKAI HARUKAZU (JP)
YEFIMOVICH KARDASH IGOR (RU)
VLADIMIROVICH PEBALK ANDREI (RU)
NICOLAEVICH CHVALUN SERGEI (RU)
ANDRANIKOVICH MAILYAN KAREN (RU)
Application Number:
PCT/JP2002/007388
Publication Date:
February 13, 2003
Filing Date:
July 22, 2002
Export Citation:
Assignee:
HITACHI LTD (JP)
KARPOV PHYS CHEM INST (RU)
TAKAHASHI AKIO (JP)
SATSU YUICHI (JP)
NAKAI HARUKAZU (JP)
YEFIMOVICH KARDASH IGOR (RU)
VLADIMIROVICH PEBALK ANDREI (RU)
NICOLAEVICH CHVALUN SERGEI (RU)
ANDRANIKOVICH MAILYAN KAREN (RU)
KARPOV PHYS CHEM INST (RU)
TAKAHASHI AKIO (JP)
SATSU YUICHI (JP)
NAKAI HARUKAZU (JP)
YEFIMOVICH KARDASH IGOR (RU)
VLADIMIROVICH PEBALK ANDREI (RU)
NICOLAEVICH CHVALUN SERGEI (RU)
ANDRANIKOVICH MAILYAN KAREN (RU)
International Classes:
C08G61/02; C08J5/18; H01L21/312; H01L21/76; H01L49/02; (IPC1-7): C08J5/18; C08G61/02; H01L21/768; H01L21/312
Domestic Patent References:
| WO1997015699A2 | 1997-05-01 |
Foreign References:
| EP0966039A2 | 1999-12-22 | |||
| US5804259A | 1998-09-08 | |||
| JPH10195181A | 1998-07-28 |
Other References:
HARUS A.S. ET AL.: "Parylene AF-4: A low epsilon r materials candidate for ULSI multilevel interconnect applications", MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, vol. 443, 1997, pages 21 - 33, XP001120234
Attorney, Agent or Firm:
Takada, Yukihiko (Saiwai-cho 2-chome Hitachi-shi, Ibaraki, JP)
Download PDF: