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Title:
ORGANIC SILICA THIN FILM, METHOD FOR PRODUCING THE SAME, LASER DESORPTION/IONIZATION MASS SPECTROMETRIC SUBSTRATE USING THE SAME, AND LASER DESORPTION/IONIZATION MASS SPECTROMETRIC METHOD
Document Type and Number:
WIPO Patent Application WO/2019/181970
Kind Code:
A1
Abstract:
An organic silica thin film comprising: organic silica having a light absorbable organic group in a skeleton, wherein the organic group has a local maximum absorption wavelength in a wavelength range of 200 to 1200 nm, a content ratio of silicon and the organic group which constitute the organic silica is in a range of 0.05 to 0.50 based on a ratio of a mass of the silicon to a mass of the organic group ([mass of the silicon]/[mass of the organic group]), the thin film has a textured structure, and an axis direction of the textured structure is a direction substantially perpendicular to a surface opposite to a surface of the organic silica thin film having the textured structure formed therein.

Inventors:
MIZOSHITA Norihiro (41-1 Yokomichi, Nagakute-sh, Aichi 92, 〒4801192, JP)
SASAKI Yuri (41-1 Yokomichi, Nagakute-sh, Aichi 92, 〒4801192, JP)
GOTO Yasutomo (41-1 Yokomichi, Nagakute-sh, Aichi 92, 〒4801192, JP)
INAGAKI Shinji (41-1 Yokomichi, Nagakute-sh, Aichi 92, 〒4801192, JP)
Application Number:
JP2019/011561
Publication Date:
September 26, 2019
Filing Date:
March 19, 2019
Export Citation:
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Assignee:
KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO (41-1, Yokomichi Nagakute-sh, Aichi 92, 〒4801192, JP)
International Classes:
G01N27/64; B01J20/10; G01N33/483; H01J49/04
Domestic Patent References:
WO2002093170A12002-11-21
Foreign References:
KR101592517B12016-02-11
JP2014115187A2014-06-26
US20100323917A12010-12-23
US6958480B12005-10-25
JP2014115187A2014-06-26
JP2008084836A2008-04-10
Attorney, Agent or Firm:
CENTCREST IP ATTORNEYS (Kikuya Bldg. 9th Floor, 2-8-21 Kyobashi, Chuo-k, Tokyo 31, 〒1040031, JP)
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