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Patent Searching and Data


Title:
ORGANOMETALLIC COMPOUND AND PRODUCTION METHOD THEREOF, AND THIN FILM USING SAME AND PRODUCTION METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2018/155837
Kind Code:
A1
Abstract:
An organometallic compound and a production method thereof, and a thin film using the same and a production method thereof according to the present invention can increase a thin film deposition rate, decrease contamination in the process, and can be used in a wide temperature range. In addition, the present invention can remarkably improve reliability and efficiency of the manufacturing process.

Inventors:
BYUN YOUNG HUN (KR)
KIM HO HOON (KR)
KIM JEUM JONG (KR)
BAE WOO RI (KR)
LEE YUN SIK (KR)
SHIN SU JUNG (KR)
KANG EUN YOUNG (KR)
Application Number:
PCT/KR2018/001486
Publication Date:
August 30, 2018
Filing Date:
February 05, 2018
Export Citation:
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Assignee:
MECARO CO LTD (KR)
International Classes:
C07F7/00; C23C16/18; C23C16/455; H01L21/02; H01L21/285
Foreign References:
KR101263454B12013-11-27
KR20100016477A2010-02-12
KR20150105747A2015-09-18
KR20080101040A2008-11-21
Other References:
JUNG, J. ET AL.: "Atomic Layer Deposition of ZrO2 Thin Film on Si(100) Using { eta5:eta1-C ( CH 2)3NMe}Zr(NMe2)2/03 as Precursors", THIN SOLID FILMS, vol. 589, 2015, pages 831 - 837, XP055473990
PATHAK, A. K. ET AL.: "Studies on Some Coordination Complexes of Bis (cyclopentadienyl)titatinum(IV) Dichloride and Bis(cyclopentadienyl)zirconium(IV) Dichloride", JOURNAL OF THE INDIAN CHEMICAL SOCIETY, vol. 73, no. 6, 1996, pages 227 - 232, XP055551345
Attorney, Agent or Firm:
ERUUM & LEEON INTELLECTUAL PROPERTY LAW FIRM (KR)
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