Title:
ORGANOMETALLIC COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF
Document Type and Number:
WIPO Patent Application WO2006044446
Kind Code:
A3
Abstract:
This invention relates to organometallic compounds represented by the formula LML' wherein M is a metal or metalloid, L is a substituted or unsubstituted cyclopentadienyl group or cyclopentadienyl-like group, a substituted or unsubstituted pentadienyl group or pentadienyl-like group, or a substituted or unsubstituted pyrrolyl group or pyrrolyl-like group, and L' is a substituted or unsubstituted pyrrolyl group or pyrrolyl-like group, a process for producing the organometallic compounds, and a method for producing a film or coating from the organometallic compounds. The organometallic compounds are useful in semiconductor applications as chemical vapor or atomic layer deposition precursors for film depositions.
Inventors:
MEIERE SCOTT HOUSTON (US)
Application Number:
PCT/US2005/036656
Publication Date:
June 29, 2006
Filing Date:
October 13, 2005
Export Citation:
Assignee:
PRAXAIR TECHNOLOGY INC (US)
MEIERE SCOTT HOUSTON (US)
MEIERE SCOTT HOUSTON (US)
International Classes:
C07D207/323; C07F17/02
Other References:
KELLY ET AL: "Azaruthenocenes: Preparation of[(n5-C4Me4N)Ru(n5-C5Me5)]and[(n5-C4Me4N)2Ru], the First Ruthenium Metallocenes Incorporating n5-Pyrrolyl Ligands", ORGANOMETALLICS, vol. 11, no. 12, 1992, pages 4348 - 4350, XP003017519
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