Title:
OVERLAY ERROR MEASUREMENT DEVICE AND COMPUTER PROGRAM
Document Type and Number:
WIPO Patent Application WO/2017/130365
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an overlay error measurement device that is capable of accurately recognizing patterns and executing overlay error measurement, even when one pattern overlaps with another pattern in some areas but not in others. In order to do so, the present invention provides an overlap error measurement device provided with a calculating device for calculating overlay error. The overlap error measurement device is provided with an image designation device for designating a plurality of regions demarcated by luminance borders on an image. The calculating device recognizes, as a first pattern, a region in an image to be measured, corresponding to the plurality of regions demarcated by luminance borders, and uses the recognized first pattern to measure overlay error.
Inventors:
FUKUNAGA FUMIHIKO (JP)
Application Number:
PCT/JP2016/052560
Publication Date:
August 03, 2017
Filing Date:
January 29, 2016
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01L21/66; G01B15/00; H01J37/22; H01L21/027
Domestic Patent References:
| WO2014181577A1 | 2014-11-13 |
Foreign References:
| JP2015099054A | 2015-05-28 |
Attorney, Agent or Firm:
TODA Yuji (JP)
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