OVERLAY KEY, METHOD FOR FORMING OVERLAY KEY AND METHOD FOR MEASURING OVERLAY ACCURACY

WIPO Patent Application WO/2017/140034

A1

An overlay key, a method for forming an overlay key and a method for measuring overlay accuracy. The overlay key comprises at least two overlay markers (201, 201'; 202, 202'; 203, 203'), wherein each of the overlay markers (201, 201'; 202, 202'; 203, 203') has first sub-markers (201, 202, 203) and second sub-markers (201', 202', 203') centrosymmetric to each other, and each of the first sub-markers (201, 202, 203) and each of the second sub-markers (201', 202', 203') comprise two mutually perpendicular strip-shaped patterns having a common end. At least two of the overlay markers (201, 201'; 202, 202'; 203, 203') are located on different layers. By means of the overlay key, the requirement of an overlay key for a larger substrate area can be alleviated or reduced, and the overlay accuracy between different layers can be measured.

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ZHANG YUHU (CN)
WANG JUNMAO (CN)
NIE BIN (CN)
YUE HAO (CN)

PCT/CN2016/080885

August 24, 2017

May 03, 2016

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BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI BOE OPTOELECTRONICS TECH (CN)

G03F7/20; G03F9/00

CN103713467A	2014-04-09
CN103377963A	2013-10-30
CN105511235A	2016-04-20
US6278116B1	2001-08-21
US8513822B1	2013-08-20

CHINA PATENT AGENT (H.K.) LTD. (CN)

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