Title:
OVERLAY MEASUREMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/191213
Kind Code:
A1
Abstract:
The present invention relates to an overlay measurement device. More specifically, the present invention relates to an overlay measurement device capable of quickly measuring an overlay error between layers having a great height difference. As a device for measuring an error between a pair of first and second overlay marks respectively formed on different layers formed on a wafer, the present invention provides an overlay measurement device comprising: an imaging system configured to acquire alignment images of the pair of first and second overlay marks at a plurality of focal positions; and a controller communicatively coupled to the imaging system. The overlay measurement device according to the present invention has the advantage of being able to quickly and accurately measuring an overlay error between layers having a great height difference.
Inventors:
SHIN HYEON GI (KR)
RYU BO KYUNG (KR)
KO JUNG SUN (KR)
PARK JIN WOO (KR)
RYU BO KYUNG (KR)
KO JUNG SUN (KR)
PARK JIN WOO (KR)
Application Number:
PCT/KR2022/016028
Publication Date:
October 05, 2023
Filing Date:
October 20, 2022
Export Citation:
Assignee:
AUROS TECH INC (KR)
International Classes:
G01N21/95; G01B11/24; G01N21/88; G01N21/956; G03F7/20
Foreign References:
| KR20210031015A | 2021-03-19 | |||
| KR20200031744A | 2020-03-25 | |||
| KR20220016950A | 2022-02-10 | |||
| KR20200000474A | 2020-01-02 | |||
| KR20000066320A | 2000-11-15 |
Attorney, Agent or Firm:
DYNE PATENT & LAW FIRM (KR)
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