Title:
OXIDE SINTERED BODY, METHOD FOR PRODUCING SAME AND SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2017/119381
Kind Code:
A1
Abstract:
Provided is an oxide sintered body that is used for a sputtering target which has high film formation rate and is free from a splash from the target surface even during the high-power film formation, and which enables the achievement of a film with a high refractive index.
The present invention uses an oxide sintered body which contains, as constituent elements, zinc, niobium, aluminum and oxygen, and wherein if Zn, Nb and Al respectively represent the contents of zinc, niobium and aluminum, Zn, Nb and Al satisfy:
Nb/(Zn + Nb + Al) = 0.076-0.289; and
Al/(Zn + Nb + Al) = 0.006-0.031.
Inventors:
ITOH KENICHI (JP)
HARA HIROYUKI (JP)
HARA SHINICHI (JP)
HARA HIROYUKI (JP)
HARA SHINICHI (JP)
Application Number:
PCT/JP2016/089029
Publication Date:
July 13, 2017
Filing Date:
December 28, 2016
Export Citation:
Assignee:
TOSOH CORP (JP)
International Classes:
C04B35/453; C23C14/08; C23C14/34
Foreign References:
| JP2000119062A | 2000-04-25 | |||
| JP2009221589A | 2009-10-01 | |||
| JP2013036073A | 2013-02-21 |
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