OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHODS FOR MANUFACTURING SAME

Title:

OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHODS FOR MANUFACTURING SAME

Document Type and Number:

WIPO Patent Application WO/2017/183263

Kind Code:

A1

Abstract:

An oxide sintered body that: satisfies 40 atom%≤[Zn]≤55 atom%, 20 atom%≤[In]≤40 atom%, 5 atom%≤[Ga]≤15 atom%, and 5 atom%≤[Sn]≤20 atom% when the percentages (atom%) of contents of zinc, indium, gallium, and tin with respect to all metal elements excluding oxygen are, respectively, [Zn], [In], [Ga], and [Sn]; has a relative density of 95% or more; and includes, as a crystal phase, 5 to 20 volume% of InGaZn2O5.

Inventors:

TAO YUKI
NAKANE YASUO
HATA HIDEO

Application Number:

PCT/JP2017/004821

Publication Date:

October 26, 2017

Filing Date:

February 09, 2017

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Assignee:

KOBELCO RES INST INC (JP)

International Classes:

C04B35/453; C23C14/34; H01L21/363

Domestic Patent References:

WO2013179676A1

2013-12-05

Foreign References:

JP2014058416A	2014-04-03
JP2014058415A	2014-04-03
JP2013108181A	2013-06-06

Attorney, Agent or Firm:

SAMEJIMA, Mutsumi et al. (JP)

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