Title:
OXIDE SINTERED COMPACT FOR PRODUCING TRANSPARENT CONDUCTIVE FILM
Document Type and Number:
WIPO Patent Application WO/2010/035716
Kind Code:
A1
Abstract:
An ITO amorphous transparent conductive film used in a display electrode for a flat panel display or the like, which can be produced without heating a substrate and without feeding water during the sputtering, while achieving both high etchability and lower resistivity at high levels. Specifically disclosed is an oxide sintered compact which is characterized by containing indium oxide as a main component, while containing one or more elements selected from nickel, manganese, aluminum and germanium as first additional elements, with the total content of the first additional elements being 2-12 atom% relative to the total amount of indium and the first additional elements.
Inventors:
IKUSAWA, Masakatsu (Nippon Mining & Metals Co. Ltd., 187-4, Usuba, Hanakawa-cho, Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
生澤 正克 (〒35 茨城県北茨城市華川町臼場187番地4 日鉱金属株式会社磯原工場内 Ibaraki, 〒3191535, JP)
生澤 正克 (〒35 茨城県北茨城市華川町臼場187番地4 日鉱金属株式会社磯原工場内 Ibaraki, 〒3191535, JP)
Application Number:
JP2009/066394
Publication Date:
April 01, 2010
Filing Date:
September 18, 2009
Export Citation:
Assignee:
Nippon Mining & Metals Co.,Ltd. (10-1, Toranomon 2-chomeMinato-k, Tokyo 01, 〒1050001, JP)
日鉱金属株式会社 (〒01 東京都港区虎ノ門二丁目10番1号 Tokyo, 〒1050001, JP)
IKUSAWA, Masakatsu (Nippon Mining & Metals Co. Ltd., 187-4, Usuba, Hanakawa-cho, Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
日鉱金属株式会社 (〒01 東京都港区虎ノ門二丁目10番1号 Tokyo, 〒1050001, JP)
IKUSAWA, Masakatsu (Nippon Mining & Metals Co. Ltd., 187-4, Usuba, Hanakawa-cho, Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
International Classes:
C04B35/00; C23C14/08; H01B1/08; H01B5/14; H01B13/00
Attorney, Agent or Firm:
AXIS Patent Internationl (Yushi Kogyo Kaikan, 13-11Nihonbashi 3-chome,Chuo-k, Tokyo 27, 〒1030027, JP)
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