Title:
PROCESS FOR PRODUCTION OF Ni FILM
Document Type and Number:
WIPO Patent Application WO/2011/040385
Kind Code:
A1
Abstract:
A cycle comprising the steps mentioned below is carried out once or multiple times: a step of forming a nitrogen-containing Ni film on a base plate by means of CVD using nickel amidinate as a film formation raw material and at least one component selected from ammonia, hydrazine and derivatives thereof as a reduction gas; and a step of supplying a hydrogen gas to the nitrogen-containing Ni film to cause the generation of hydrogen atoms by the action of Ni that acts as a catalyst and detaching nitrogen from the nitrogen-containing Ni film by the action of the hydrogen atoms.
Inventors:
SUZUKI MIKIO (JP)
NISHIMORI TAKASHI (JP)
YUASA HIDEKI (JP)
NISHIMORI TAKASHI (JP)
YUASA HIDEKI (JP)
Application Number:
PCT/JP2010/066764
Publication Date:
April 07, 2011
Filing Date:
September 28, 2010
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
SUZUKI MIKIO (JP)
NISHIMORI TAKASHI (JP)
YUASA HIDEKI (JP)
SUZUKI MIKIO (JP)
NISHIMORI TAKASHI (JP)
YUASA HIDEKI (JP)
International Classes:
C23C16/18; C23C16/44; H01L21/28; H01L21/285
Domestic Patent References:
| WO2009088522A2 | 2009-07-16 | |||
| WO2008015914A1 | 2008-02-07 |
Foreign References:
| JP2006511716A | 2006-04-06 | |||
| JP2009079285A | 2009-04-16 | |||
| JP2002069088A | 2002-03-08 |
Attorney, Agent or Firm:
TAKAYAMA HIROSHI (JP)
Hiroshi Takayama (JP)
Hiroshi Takayama (JP)
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