Title:
PARTIAL HYDROLYSIS-CONDENSATION PRODUCT AND INK REPELLENT AGENT USING SAME
Document Type and Number:
WIPO Patent Application WO/2014/046210
Kind Code:
A1
Abstract:
Provided are: a partial hydrolysis-condensation product which is capable of producing a negative photosensitive resin composition that exhibits good alkali solubility and is capable of forming a partition wall which has an upper surface exhibiting good ink repellency and good UV/O3 resistance; and an ink repellent agent. Provided is a negative photosensitive resin composition which is capable of forming a partition wall that has an upper surface exhibiting good ink repellency. Also provided are: a cured film and a partition wall which are capable of maintaining good ink repellency even after an UV/O3 irradiation treatment; and an optical element wherein an ink can be uniformly applied within a dot.
A partial hydrolysis-condensation product of a mixture which contains: a first hydrolyzable silane compound that has a hydrolyzable group and a fluoroalkylene group and/or a fluoroalkyl group, but does not have an acidic group; and a second hydrolyzable silane compound that has an acidic group and a hydrolyzable group.
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Inventors:
FURUKAWA YUTAKA (JP)
TAKAHASHI HIDEYUKI (JP)
KAWASHIMA MASAYUKI (JP)
YAMADA KOTARO (JP)
TAKAHASHI HIDEYUKI (JP)
KAWASHIMA MASAYUKI (JP)
YAMADA KOTARO (JP)
Application Number:
PCT/JP2013/075366
Publication Date:
March 27, 2014
Filing Date:
September 19, 2013
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
C08G77/24; G03F7/027; G03F7/075; H01L21/027; H01L51/50; H05B33/12; H05B33/22
Domestic Patent References:
WO2010125618A1 | 2010-11-04 | |||
WO2010013816A1 | 2010-02-04 |
Foreign References:
JPH04311782A | 1992-11-04 | |||
JPS6440677A | 1989-02-10 | |||
JP2002293824A | 2002-10-09 | |||
JP2009079889A | 2009-04-16 | |||
JP2009007572A | 2009-01-15 | |||
JP2000095822A | 2000-04-04 | |||
JPH02196880A | 1990-08-03 | |||
JP2005036160A | 2005-02-10 | |||
JP2004277494A | 2004-10-07 |
Attorney, Agent or Firm:
SENMYO, Kenji et al. (JP)
Spring name Kenji (JP)
Spring name Kenji (JP)
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