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Patent Searching and Data


Title:
PARTICLE BEAM ANALYSIS DEVICE AND PARTICLE BEAM ANALYSIS METHOD
Document Type and Number:
WIPO Patent Application WO/2023/135712
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a particle beam analysis device and a particle beam analysis method which are capable of estimating the density distribution of a spatial structure objectively with good precision while reducing the processing load. The present invention comprises: an uncertainty evaluation unit (106) that, with respect to a plurality of spatial density distributions corresponding to a profile selected by a profile selection unit, calculates an optimization target position, which is a spatial position identified on the basis of variations in spatial density distribution per spatial position; a difference regression analysis unit (105) that uses data held in a profile database (110) and a difference calculated by a profile difference evaluation unit (107) to calculate, by regression analysis, a function which determines, from the spatial density distribution, the difference from an input profile; and a spatial density distribution optimization unit (103) that calculates the spatial density distribution at which the difference of the function calculated by the difference regression analysis unit becomes a minimum, using as a variable only the spatial density at the optimization target position calculated by the uncertainty evaluation unit (106).

Inventors:
ASAHARA AKINORI (JP)
YAMAMOTO MITSUYA (JP)
MORITA HIDEKAZU (JP)
Application Number:
PCT/JP2022/000971
Publication Date:
July 20, 2023
Filing Date:
January 13, 2022
Export Citation:
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Assignee:
HITACHI LTD (JP)
International Classes:
G01N23/20
Foreign References:
JP2019056587A2019-04-11
JP2006113042A2006-04-27
JP2004020196A2004-01-22
JP2017116330A2017-06-29
JP2014052223A2014-03-20
JP2018179537A2018-11-15
CN104089851A2014-10-08
Attorney, Agent or Firm:
DAI-ICHI INTERNATIONAL PATENT OFFICE, P.C. (JP)
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