Title:
PARTICLE MEASUREMENT METHOD AND PARTICLE MEASUREMENT SENSOR DEVICE USED FOR SAME
Document Type and Number:
WIPO Patent Application WO/2023/149526
Kind Code:
A1
Abstract:
In this particle measurement method, a particle measurement sensor device 300 is used. In the particle measurement sensor device 300, a thin film 200 is in contact with a Si single crystal substrate 290, in which an Si single crystal communication part 299 is provided in an indented manner and a pointed-end opening 101 leading to the Si single crystal communication part 299 opens thereon, the thin film 200 covering the Si single crystal substrate 290 so as to also cover the pointed-end opening 101. A small hole 209 communicating with the pointed-end opening 101 is formed in the thin film 200. The particle measurement sensor device 300 has: a particle-injection-side channel 210 and a non-particle-injection-side channel 220, which flank the Si single crystal substrate 290 and which communicate with the Si single crystal communication part 299; and a particle-injection-side channel connection part 219 and a non-particle-injection-side channel connection part 229 connecting to the Si single crystal communication part 299. No hydrophilizing agent adheres to the non-particle-injection-side channel 220 and the non-particle-injection-side channel connection part 229.
Inventors:
SHIMAMURA KAZUKI (JP)
TAKANO TSUTOMU (JP)
TAKEI HIROYASU (JP)
NAONO NORIHIKO (JP)
TAKANO TSUTOMU (JP)
TAKEI HIROYASU (JP)
NAONO NORIHIKO (JP)
Application Number:
PCT/JP2023/003476
Publication Date:
August 10, 2023
Filing Date:
February 02, 2023
Export Citation:
Assignee:
ASAHI FR R&D CO LTD (JP)
AIPORE INC (JP)
AIPORE INC (JP)
International Classes:
G01N27/00; C12M1/34; G01N15/12
Domestic Patent References:
| WO2021079598A1 | 2021-04-29 | |||
| WO2020230219A1 | 2020-11-19 | |||
| WO2013137209A1 | 2013-09-19 |
Foreign References:
| JP2016126003A | 2016-07-11 | |||
| US20130092541A1 | 2013-04-18 |
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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