Title:
PARTICULATE SILICA MATERIAL AND PARTICULATE SILICA MATERIAL DISPERSION
Document Type and Number:
WIPO Patent Application WO/2020/144923
Kind Code:
A1
Abstract:
Provided is a particulate silica material dispersion which is capable of achieving a high packing factor. The present invention comprises a particulate silica material that has a median size of 150 nm or less and a dispersion medium which disperses the particulate silica material, wherein I100/half width of a small angle X-ray scattering spectrum thereof is 300 or less. "I100" is the peak top of the largest peak in the small angle X-ray scattering spectrum. The small angle X-ray scattering spectrum is measured for the particulate silica material dispersion. Specifically, intensity values are standardized with a sum total of values being 100, wherein values are obtained by multiplying, by 0.01, intensity values (arbitrary unit) measured in 0.001° increments from 0.001 to 1.0° in the small angle X-ray scattering spectrum. The largest value from among the intensities is I100 and half the intensity value I100 is I50. The peak width at the intensity of I50 in a peak to which I100 belongs is defined as the half width (unit°) of I100.
Inventors:
ARAI YUKI (JP)
TOMITA NOBUTAKA (JP)
TOMITA NOBUTAKA (JP)
Application Number:
PCT/JP2019/043369
Publication Date:
July 16, 2020
Filing Date:
November 06, 2019
Export Citation:
Assignee:
ADMATECHS CO LTD (JP)
International Classes:
C01B33/18; C08K3/36; C08K7/00; C08L101/00; C09C1/30; C09C3/00
Domestic Patent References:
| WO2014199843A1 | 2014-12-18 |
Foreign References:
| JP2014201461A | 2014-10-27 |
Attorney, Agent or Firm:
KYORITSU INTERNATIONAL (JP)
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