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Title:
PATTERN DECISION METHOD AND SYSTEM, MASK MANUFACTURING METHOD, FOCUSING PERFORMANCE ADJUSTING METHOD, EXPOSURE METHOD AND DEVICE, PROGRAM, AND INFORMATION RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2004/099874
Kind Code:
A1
Abstract:
According to adjustment information on the adjusting device under a predetermined exposure condition, information on the corresponding focusing performance of the projection optical system, pattern correction information, focusing performance allowance range information, and the like, an appropriate adjustment amount under the target exposure condition where the pattern has been corrected is calculated for each of exposure devices (steps 114 to 118). As a result of adjustment of the adjusting device following the appropriate adjustment amount of each exposure device calculated, if at least one exposure device has a focusing performance out of the allowance range under the target exposure condition, the correction information is set according to a predetermined reference based on the focusing performance (steps 120, 124, 126). The aforementioned steps 114 to 118, 120, 124, and 126 are repeated until all the devices have the focusing performance within the allowance range. When all are in the allowance range, the correction information which has been set is decided as pattern correction information (step 138).

Inventors:
HIRUKAWA SHIGERU (JP)
Application Number:
PCT/JP2004/005481
Publication Date:
November 18, 2004
Filing Date:
April 16, 2004
Export Citation:
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Assignee:
NIKON CORP (JP)
HIRUKAWA SHIGERU (JP)
International Classes:
G03F7/20; G03F7/207; (IPC1-7): G03F1/08; G03F7/20; H01L21/027
Domestic Patent References:
WO2002054036A12002-07-11
Foreign References:
JPH0915834A1997-01-17
JP2001068398A2001-03-16
JP2002025884A2002-01-25
Attorney, Agent or Firm:
Tateishi, Atsuji (Karakida Center Bldg. 1-53-9, Karakid, Tama-shi Tokyo, JP)
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