PATTERN DIMENSION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM MICROSCOPE USED IN SAME

Title:

PATTERN DIMENSION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM MICROSCOPE USED IN SAME

Document Type and Number:

WIPO Patent Application WO/2011/052339

Kind Code:

A1

Abstract:

Disclosed is a pattern dimension measurement method with minimal measurement error and excellent repeatability even if a shift in focus occurs. Also disclosed is a charged particle beam microscope used in the same. The method measures particle dimensions from the distribution of the signal strength of charged signal particles from a sample, upon which a pattern has been formed, by irradiating the sample with a charged particle beam, wherein the left and right edge index positions (X1, X2) of the maximum strength position of a signal, which correspond to the pattern edge, are calculated by means of the threshold method, and the pattern edge position (Xe) is obtained from the average value thereof. As a result, the influence of a shift in focus at the pattern edge position (Xe) can be reduced.

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Inventors:

HITOMI Keiichiro (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
人見　敬一郎 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地　株式会社日立製作所　中央研究所内 Tokyo, 〒1858601, JP)
NAKAYAMA Yoshinori (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)

Application Number:

JP2010/067107

Publication Date:

May 05, 2011

Filing Date:

September 30, 2010

Export Citation:

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Assignee:

HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
HITOMI Keiichiro (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
人見　敬一郎 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地　株式会社日立製作所　中央研究所内 Tokyo, 〒1858601, JP)

International Classes:

G01B15/00

Attorney, Agent or Firm:

POLAIRE I.P.C. (7-1 Hatchobori 2-chome, Chuo-ku Tokyo, 32, 〒1040032, JP)

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