Title:
PATTERN DIMENSION MEASUREMENT METHOD USING ELECTRON MICROSCOPE, PATTERN DIMENSION MEASUREMENT SYSTEM, AND METHOD FOR MONITORING CHANGES IN ELECTRON MICROSCOPE EQUIPMENT OVER TIME
Document Type and Number:
WIPO Patent Application WO/2012/014356
Kind Code:
A1
Abstract:
Beforehand, the device characteristic parameters of each critical dimension SEM are measured, the cross-sectional shapes of an object to undergo dimension measurements are estimated by a model-based library (MBL) matching system, dimension measurements are carried out by generating signal waveforms by SEM simulation as inputs for the estimated cross-sectional shapes and the device characteristic parameters, and the differences in the dimension measurement results are recorded as machine differences. In actual measurements, from the dimension measurement results for each critical dimension SEM, machine differences are corrected by reducing the recorded machine differences. Furthermore, changes in critical dimension SEMs over time are monitored by periodically measuring the abovementioned device characteristic parameters and predicting the abovementioned dimension measurement results. According to the present invention, actual measurements of machine differences, which require considerable time and effort, are unnecessary. In addition, the effects of changes in samples over time, which are problematic in the monitoring of changes in devices over time, can be eliminated.
Inventors:
SHISHIDO, Chie (HITACHI LTD., 292 Yoshida-cho, Totsuka-ku, Yokohama-sh, Kanagawa 17, 〒2440817, JP)
宍戸 千絵 (〒17 神奈川県横浜市戸塚区吉田町２９２番地 株式会社日立製作所 横浜研究所内 Kanagawa, 〒2440817, JP)
TANAKA, Maki (HITACHI HIGH-TECHNOLOGIES Corporation 882 Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
宍戸 千絵 (〒17 神奈川県横浜市戸塚区吉田町２９２番地 株式会社日立製作所 横浜研究所内 Kanagawa, 〒2440817, JP)
TANAKA, Maki (HITACHI HIGH-TECHNOLOGIES Corporation 882 Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
Application Number:
JP2011/002807
Publication Date:
February 02, 2012
Filing Date:
May 20, 2011
Export Citation:
Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
SHISHIDO, Chie (HITACHI LTD., 292 Yoshida-cho, Totsuka-ku, Yokohama-sh, Kanagawa 17, 〒2440817, JP)
宍戸 千絵 (〒17 神奈川県横浜市戸塚区吉田町２９２番地 株式会社日立製作所 横浜研究所内 Kanagawa, 〒2440817, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
SHISHIDO, Chie (HITACHI LTD., 292 Yoshida-cho, Totsuka-ku, Yokohama-sh, Kanagawa 17, 〒2440817, JP)
宍戸 千絵 (〒17 神奈川県横浜市戸塚区吉田町２９２番地 株式会社日立製作所 横浜研究所内 Kanagawa, 〒2440817, JP)
International Classes:
G01B15/04; H01J37/28
Attorney, Agent or Firm:
INOUE, Manabu et al. (6-1, Marunouchi 1-chome, Chiyoda-k, Tokyo 20, 〒1008220, JP)
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Claims: